Development of Automated Batch Polishing and Reclaiming System for Epi-ready CdZnTe

MATECH will demonstrate, during Phase I, the capability to polish CdZnTe substrates to state-of-the-art EPI-ready quality. MATECH has already demonstrated a preliminary capability to produce EPI-ready material of superior quality. Phase II will automate and deliver a system capable of automated simultaneous polishing and reclaiming multiple substrates of sizes up to, at least, 70x70mm. MATECH will demonstrate that the polished CdZnTe substrates have a rocking curve virtually undistinguishable from the bulk material, as well as suitable topography as determined by AFM. At the core of the proposed effort is a novel, modified, non-contact chemical polishing process capable of producing consistent EPI quality CdZnTe substrates from ground material. This is a very important advance because, since the polishing is done purely by the chemistry and no abrasives are involved, mechanical subsurface damage and other structural defects caused by the polishing media and mechanical process are entirely avoided. MATECH has developed other materials, processes and systems for the Government before, and has successfully introduced most of them into commercial manufacture. MATECH has been featured in the Missile Defense Agency (MDA) 2002 Antiterrorism Technologies Report, on the cover of its 2003 Technology Applications Report, and in its Summer 2003 No.46 MDA Update.