PRECISE FLUX CONTROL FOR LATTICE MATCHED SUPERLATTICE MATERIALS

AN EFFECTIVE METHOD FOR REDUCING FLUX TRANSIENTS IN MOLECULAR BEAM EPITAXY (MBE) EFFUSION CELL SOURCE IS PROPOSED. MBE IS A USEFUL TECHNIQUE FOR FABRICATING MANY IMPORTANT ELECTRONIC AND OPTOELECTRONIC DEVICES WHOSE PERFORMANCE DEPENDS CRITICALLY ON REPRODUCIBLE MATERIAL STRUCTURES. TIGHT CONTROL OF THE STRUCTURES IS OFTEN HINDERED BY FLUX TRANSIENTS DURING SOURCE SHUTTER OPERATION. WE PROPOSE A METHOD TO ELIMINATE THESE TRANSIENTS SO STABLE FLUX CAN BE ACHIEVED THROUGHOUT THE GROWTH PROCESS. THE TECHNIQUE INCORPORATES FEATURES IN THE SOURCE CELL-SHUTTER ASSEMBLY DESIGN THAT MINIMIZES THERMAL TRANSIENTS AND USES PROGRAMMED TEMPERATURE RAMPING TO MAINTAIN STABLE FLUX. ELIMINATION OF FLUX TRANSIENT WILL BE DEMONSTRATED IN ACTUAL MBE ENVIRONMENT.