SBIR/STTR Research Award

SBIR PHASE I: Closed-Field Magnetron Sputtering with RF Plasma Enhancement for Large Flat Panel Displays

Award identifier 12137a26e60fb92a783763851d34cdae107b8d273d57a641299ebf03b4f90413Awarding agency National Science Foundation

Award amount

$100,000

Program and phase

SBIR · Phase I

Award year

2008

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Kurt J. Lesker Company
Proposal award date
Not reported
Contract end date
Not reported
UEI
E2JQUCNKLE93
Solicitation number
NSF 07-551
Topic code
AM

Research abstract

This Small Business Innovation Research (SBIR) proposes to build and diagnose a new type of Magnetron cathode system which will be particular application in the manufacture of flat panel displays. Transparent conductive oxides (TCOs) including the Indium Tin Oxide (ITO) provide a fundamentally enhanced capability for a number of display technologies. Newer technologies, including Organic Light Emitting Diodes (OLEDs) are highly promising replacements for existing products (based on the incandescent light bulb technology) if the manufacturing yield can be improved. A key goal of OLED manufacture is to create devices on flexible substrates like plastic films. Large area deposition systems suffer from difficulties in co-locating the required deposition processes, leading to difficulties in controlling and taking advantage of the interactions between processes. The proposed unique arrangement of magnetron targets with the auxiliary ion source will allow tunable control of processes that till now have operated independently. The proposed technology will allow significant reduction in the process temperatures in the fabrication process, thereby improving process yield as well as defects in the devices over the currently used TCO deposition techniques, and also permit use of temperature-sensitive substrates such as plastic films. The broader impacts of the proposed technology, if successful, will be to significantly improve the current manufacturing processes for flat panel displays. The new equipment design will enable development of other thin film deposition technologies for large-area substrates, and even allow manufacture of application-specific turnkey systems. The various industrial technologies used in microelectronics, such as flexible and thin panel television, cell phones and other portable electronic devices, films for large-area windows designed for thermal insulation without impairing visibility, etc. are some of the advanced applications which be enabled by this technology. The company's established marketing channels will ensure rapid implementation of the new technology into the industrial production systems, and will provide the U.S. with a significant leadership position in the global marketplace. The involvement of a university expert and his team will ensure that the the young scientists and engineers of tomorrow will be able to participate in the cutting-edge research that ties their classroom studies with practical applications of the findamental principles.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

5 SBIR/STTR records share this UEI (1993–2009). Reported award amounts total $945,395. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Energy

Agency intelligence

National Science Foundation

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