SBIR/STTR Research Award
JET VAPOR DEPOSITION OF THICK FILMS FOR THE PRODUCTION OF RADIOACTIVE BEAMS OF CHEMICALLY ACTIVE ELEMENTS
Award amount
$75,000Program and phase
SBIR · Phase IAward year
1994Award details
- Awarding agency
- Department of Energy
- Branch
- Not reported
- Recipient company
- JET PROCESS CORP
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- WN5MHCZRNB86
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
N/A
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Scaleup of the 'Electron Jet' Jet Vapor Deposition Source
- JVD Nitride for Hi-Pwr Hi-Temp Elec Device
- Jet Vapor Deposition¿ Process for Colossal Magneto-Resistive Films
- Enhanced Optical Limiting Thin Films by Jet Vapor Deposition
- Jet Vapor Injection of Magneto-Rheological Fluids
Research funding history
40 SBIR/STTR records share this UEI (1991–1998). Reported award amounts total $7,442,790. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Science Foundation, Department of Energy, Environmental Protection Agency, National Aeronautics and Space Administration