Development of Single Buffer Layer for Coated Conductors by MOCVD Process

The modernization and expansion of America¿s electricity delivery system is needed to ensure a more reliable and robust electricity supply. High Temperature Superconductors (HTS) are an emerging technology for this purpose; however, current techniques for producing the buffer layer, which lies between the superconducting material and its metal substrate, are cumbersome. Current buffer layers actually are comprised of multiple layers, each serving a separate function and often requiring distinctly different deposition methods. A simplified buffer architecture ¿ which could be produced via a high-rate, high-performance, cost-effective method ¿ would allow coated conductors to be produced at a lower cost and with greater efficiency. Therefore, this project will develop a high-rate, high-performance, cost effective Metal Organic Chemical Vapor Deposition (MOCVD) method for producing a single layer buffer. Phase I will prove the concept of a single layer buffer architecture obtained by MOCVD and study the minimal thickness necessary for such an architecture to be applicable to HTS coated conductors. Phase II will apply these results to the production of long lengths of coated conductor. Commerical Applications and Other Benefits as described by the awardee: A simplified, single layer buffer architecture should aid in the production of HTS wire and speed the use and application of HTS coated conductors for large power devices. The projected HTS wire cost (~ $10-15/kA-m) should open up commercial markets (in motors, transformers, transmission lines, etc.) valued at over $5B, leading to significant economic growth.