SBIR/STTR Research Award

MBE Sulfur Passivation of InP for High Power Millimeter Wave Electronics

Award identifier 459e8ed1af1500eb8115e66119b0e72bd8fb3855f2a26eccad4fa6c84cd4e7beAwarding agency Department of Defense · Air Force

Award amount

$99,959

Program and phase

SBIR · Phase I

Award year

1997

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Award details

Awarding agency
Department of Defense
Branch
Air Force
Recipient company
SVT ASSOCIATES INC
Proposal award date
Not reported
Contract end date
Not reported
UEI
MLVQMLJLC139
Solicitation number
Not reported
Topic code
Not reported

Research abstract

High frequency power semiconductor devices based on metal insulator semiconductor field effect transistor (MISFET) structures have long been desired for microwave and millimeter wave (mm wave) applications. Unfortunately, complex interface defects and Fermi level pinning at the surface of both gallium arsenide (GaAs) and indium phosphide (InP) have impeded technology to control and stabilize MIS structures on these promising materials systems. SVT Associates proposes to develop under Phase I a method to form reproducible sulfur passivated MIS structures on InP with low interface state densities by molecular beam epitaxy (MBE) of CdS films. Under Phase II, processes and hardware for sulfur passivation of high power mm wave InP MISFETs will be designed and tested.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

165 SBIR/STTR records share this UEI (1990–2014). Reported award amounts total $29,785,067. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, Department of Energy, National Science Foundation

Agency intelligence

Department of Defense

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