A Plasma-Enabled Approach to Next-Generation Energy Storage Materials
Award amount
$1,150,000Program and phase
SBIR · Phase IIAward year
2025Award details
- Awarding agency
- Department of Energy
- Branch
- Not reported
- Recipient company
- SiLi-ion Inc.
- Proposal award date
- 2025-04-14
- Contract end date
- 2027-04-13
- UEI
- DQA5DJ6AFCN7
- Solicitation number
- DE-FOA-0003462
- Topic code
- C57-23a
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Low-temperature Plasmas Enabling the Next-generation Batteries
- Low-temperature Plasma Synthesis and Processing of Next-generation Battery Materials
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Independent Electron and Ion Energy Distribution Control for Semiconductor Processing
- Ga2O3-AlN Heterojunction Epitaxy using Low-Temperature Plasmas
- Independent Electron and Ion Energy Distribution Control for Semiconductor Processing
Research funding history
3 SBIR/STTR records share this UEI (2022–2025). Reported award amounts total $1,550,000. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Energy