SBIR/STTR Research Award

Acoustic Layer Separation for Thin Film Lithium Niobate

Award identifier edd8f4749ad9e2d25a02b296fa1c18731e20914c312adcec552fa5dd0722facfAwarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$1,800,000

Program and phase

SBIR · Phase II

Award year

2025

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
Crystal Sonic, Inc.
Proposal award date
2025-04-02
Contract end date
2027-01-06
UEI
H3PSKD4G2HB7
Solicitation number
Not reported
Topic code
NASA-4-Photo

Research abstract

Thin Film Lithium Niobate (TFLN) technologies are revolutionizing high-speed communications, quantum computing, artificial intelligence, and precision sensing, making them critical for defense and commercial applications. However, existing fabrication methods such as Smart Cut (ion implantation) and backgrinding are costly, wasteful, and reliant on foreign supply chains. Sonic Lift-Off (SLO), a novel acoustic-based wafer reuse and layer separation process, addresses these challenges by enabling defect-free thin layer separation with significant cost and material savings. SLO technology, patented and developed by Crystal Sonic, employs acoustic energy and a polymeric stressor to initiate and propagate a controlled crack front, achieving precise separation of thin layers (<50 µm) without introducing crystalline defects. Unlike traditional methods, SLO ensures substrate reusability, minimal surface roughness, and scalability to larger wafer diameters. This project aims to: Demonstrate SLO feasibility for 2” and 4” LiNbO3 wafers.Develop a 6” SLO test platform with enhanced acoustic delivery capabilities.Investigate TFLN application requirements and market opportunities.Engage with commercial and government stakeholders to document customer workflows and integration needs. Building on the success of prior R&D efforts with GaAs, GaN, and SiC materials, Crystal Sonic has demonstrated the scalability of SLO to 4” diameters. This project will extend these advancements to LiNbO3, leveraging existing expertise to develop optimized recipes for various wafer orientations and thicknesses. The impact of this work is significant, establishing an onshore, cost-effective method for TFLN manufacturing that addresses supply chain vulnerabilities and supports dual-use applications. The resulting SLO test platform will provide a foundation for future commercialization, enabling compatibility with industry-standard 6” wafers and driving further innovation in advanced semiconductor manufacturing.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

5 SBIR/STTR records share this UEI (2023–2025). Reported award amounts total $4,124,340. Reported amounts are not federal obligations.

Phases: Phase II, Phase I

Agencies: National Science Foundation, National Aeronautics and Space Administration, Department of Defense

Agency intelligence

Department of Defense

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