SBIR/STTR Research Award
Voltage and Waveform Control For Improved Selectivity In Electrodeposition In Low Background Species
Award amount
$100,000Program and phase
SBIR · Phase IAward year
2009Award details
- Awarding agency
- Department of Energy
- Branch
- Not reported
- Recipient company
- Dynatronix, Inc.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- JEDYLF96A9N6
- Solicitation number
- DE-PS02-08ER08-34
- Topic code
- 49 b
Research abstract
This project supports the advancement of electroforming capabilities to produce ultra-pure copper and provides opportunities for further progress in material growth science. Ultra high purity copper is a fundamental material used for a range of current and future fundamental nuclear physics programs such asMAJORANA. The capabilities that are expected to be developed under this project will address the significantly more challenging purity requirements including the unprecedented purity levels needed in neutrinoless double-beta decay and dark matter experiments. This project requires development of an electroplating power supply and electroforming process capable of remotely controlling voltage ~100x better than anything commercially available to allow the selective deposition of metals. Dynatronix, Inc. proposes a novel method to regulate the voltage and current electrical output by employing a remote voltage sensing system coupled with circuitry design to minimize ripple, noise, and electrical overshoot. This project also expands technology currently utilized in our patented extended-range current control technology. Commercial Applications and other Benefits as described by the awardee Commercialization of this technology by the semiconductor, medical, and nanotechnology industries will lead to improved semiconductor performance, lower energy use, and efficient medical device manufacturing processes
Technology keywords
Not reported
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