SBIR/STTR Research Award

High Voltage 4H-SiC Power Devices

Award identifier 4908b7e44eecf13f6b57e81eb1d29d1a87b6c88c2c052336432a41361145ef7bAwarding agency Department of Defense · Missile Defense Agency

Award amount

$63,628

Program and phase

SBIR · Phase I

Award year

1995

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
CREE RESEARCH, INC.
Proposal award date
Not reported
Contract end date
Not reported
UEI
JENFAUM1C7L6
Solicitation number
Not reported
Topic code
Not reported

Research abstract

The rapid development of the technology for producing high quality single crystal SiC wafers and thin films presents the opportunity to fabricate solid-state devices with power-temperature capability far greater than devices currently available. While conventional silicon power devices are already being used near their limits of operating temperature and power, the potential of SiC is just beginning to be demonstrated. Vertical power MOSFET structures fabricated in 4H-SiC with 150 V capability have already shown current densities of 100 A/cm2 with a voltage drop of 3.3 V (specific on-resistance of 33 m -cm2. These devices showed good characteristics at temperatures up to 300 C. 4H-SiC thyristors have been demonstrated up to 500 C that block 200 V and have current densities of 500 A/cm2 at 3.8 V. While these are promising results, these devices have been far from reaching their theoretical voltages based on the doping levels used. One of the reasons for the relatively low voltages is the lack of good junction termination techniques for SiC. Therefore it is proposed that different junction termination designs and processes be explored and evaluated. The Phase I effort will focus on the application of these terminations to relative simple pn junction rectifiers. The methods to be evaluated will be improved passivation of mesa sidewalls and the use of non-mesa terminations such as floating field rings or field plates. A batch of identical pn junction structures will be grown on which these different methods will be used so that they can be systematically compared. The surface breakdown of SiC will also be characterized because of its importance in achieving higher power Sic microwave MESFETs, which are becoming vital for next generation phased array radar systems. The termination techniques for the rectifiers and the surface breakdown information can then be applied to more complex SiC devices currently being developed such as power MOSFETs, thyristors, and microwave MESFETS. High power silicon carbide devices which operate at high temperatures are required for a variety of power conditioning applications on radar systems, all-electric airplanes, turbine engine actuators, and space-based power systems. T

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

33 SBIR/STTR records share this UEI (1988–2000). Reported award amounts total $8,484,718. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, National Science Foundation

Agency intelligence

Department of Defense

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