SBIR/STTR Research Award
SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography
Award amount
$99,999Program and phase
SBIR · Phase IAward year
2008Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- LUMARRAY, INC.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- T2HXT55KVA34
- Solicitation number
- NSF 07-551
- Topic code
- EL
Research abstract
This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithography (AMOL) can achieve nanoscale resolution, while getting rid of the expensive photomask. Successful development of a maskless absorbance modulation optical lithograpy system will provide nanoscale resolution at lower costs than scanning electron beam lithography. This technology provides a combination of resolution and writing speed that is currently unavailable, and hence, will create a paradigm shift in the field of nanomanufacturing.
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Direct-Write Optical Lithography for High-Energy Diffractive Optics
- Computationally Optimized Metamaterial-Based Low-Power Integrated Photonics For Miniaturization And Ultra-Large-Scale Integration
- DIRECT WRITING OF X-RAY GRATINGS USING ZONE-PLATE-ARRAY LITHOGRAPHY (ZPAL)
- Lithography Cost Reduction for Rad Hard Integrated Circuits
- Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography
Research funding history
19 SBIR/STTR records share this UEI (2004–2022). Reported award amounts total $10,200,591. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Science Foundation, Department of Energy