Infrared Spectrometer for Semiconductor Process and Environmental Contaminant Testing in Realtime (INSPECTR)

This project aims to develop a high-resolution, high-sensitivity mid-infrared spectrometer designed for fast, accurate chemical monitoring in advanced semiconductor fabrication facilities. The system will be capable of detecting a wide range of molecular impurities, such as trace gases and volatile compounds, that can negatively affect the performance of cutting-edge lithography systems, thin-film deposition, and epitaxial growth processes. Additionally, it will help mitigate risks to worker safety by identifying potentially hazardous substances in real time. The technology behind this mid-infrared system combines recent advances in chip-integrated nanophotonics, precision spectroscopy, and optical frequency comb technology. At its core, the system features a novel photonic integrated circuit (PIC) that efficiently converts ultrashort nearinfrared laser pulses into optical frequency combs, spanning the 3 to 5 μm wavelength range of the mid-infrared. This wide spectral range enables multi-species detection, while the compact, chip-based platform ensures portability and ease of deployment in dynamic, high-tech environments. The mid-infrared generation platform will be seamlessly integrated into a larger commercial instrument utilizing high-sensitivity optical frequency comb spectroscopy. This integrated system will monitor molecular impurities at parts-per-billion levels, both inside and around semiconductor fabrication facilities. Ultimately, the monitoring system will enhance productivity, improve product quality, ensure worker safety, and contribute to the long-term environmental sustainability of semiconductor fabrication facilities.