SBIR/STTR Research Award

Elastic Emission Machining of Substrates for EUV, Optical, and Infrared Optics

Award identifier de8e8488b5d5bb162c3df8a7dbc4dbf870ad5e4c8782d4c1a16450e0678c48b8Awarding agency National Aeronautics and Space Administration

Award amount

$850,000

Program and phase

SBIR · Phase II

Award year

2024

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Award details

Awarding agency
National Aeronautics and Space Administration
Branch
Not reported
Recipient company
OPTIPRO SYSTEMS, LLC
Proposal award date
2024-07-12
Contract end date
2026-07-11
UEI
XKL1W166KZ15
Solicitation number
SBIR_23_P2
Topic code
S12

Research abstract

The need for highly accurate and cost efficient deterministic polishing methods on a variety of materials is apparent. Diffraction limited, low cost, and low weight normal-incidence mirror systems are required to enablenbsp;telescopes for missions of all sizes, ranging from CubeSatsnbsp;to Probe and Flagship missions. Anbsp;solution that is applicable to any size and material is crucial. Elastic Emission Machiningnbsp;can achieve these tolerances and is scalablenbsp;while remaining highly precise with highly stable removal rates. EEM is a chemical polishing method which causes low-energy, non-damaging collisions to occur between particulates and the substrate surface. These gentle collisions do not directly remove material from the surface. Chemical reactions occur between the particulates and the surface whereby the particles become chemically bound to the surface atoms. The fluid in which the particles are immersed is accelerated to flow and produces a sheering force on the bound particle, which pulls the particle ndash; and its attached substrate atom ndash; from the substrate, thereby producing an atomic-level machining operation. This type of material removal process does not inject heat, nor does it damage the atomic lattice structure, preventing sub-surface damage. Due to the material being removed efficiently from the surface by the polishing particulate, a Beilby layer is not allowed to form and ldquo;healrdquo; over the optical surface. During the Phase I effort it wasnbsp;successfully demonstrated on Ultra Low Expansion Glass (ULE)nbsp;and Zerodur. Mirror support through mitigation on light-weighted ULE and Zerodur substrates was also a goal which OptiPro wished to complete in this Phase I project. Support print through is a problem with light-weighted mirrors in which the support structures are apparent in the mirror surface whichnbsp;EEM can address and solve. These factors were found to be successfully mitigated during the project and successful correction of light-weighted mirrors was accomplished.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

63 SBIR/STTR records share this UEI (2004–2025). Reported award amounts total $30,061,401. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, Department of Energy, Department of Homeland Security

Agency intelligence

National Aeronautics and Space Administration

Back to SBIR/STTR Research Awards

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