SBIR/STTR Research Award

Elastic Emission Machining of Optics for Structural Biology Imaging

Award identifier 4d7e3ee4490592013922cd7f5e157734a5e6a36923dd06b2a75f104611559cebAwarding agency Department of Energy

Award amount

$1,112,306

Program and phase

SBIR · Phase II

Award year

2024

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Award details

Awarding agency
Department of Energy
Branch
Not reported
Recipient company
OPTIPRO SYSTEMS, LLC
Proposal award date
2024-04-01
Contract end date
2026-03-31
UEI
XKL1W166KZ15
Solicitation number
DE-FOA-0003184
Topic code
C55-18a

Research abstract

As Free-Electron Laser and diffraction-limited storage ring X-ray light sources have come into their own in the past few years, the need for highly precise X-ray mirrors is becoming more and more apparent. These brighter X-ray light sources are being held back by the mirrors that are used, both in the availability of these optics, as well as their manufacturability. There are very few methods that are capable of polishing mirrors to atomic accuracy and is something that is both difficult and unreliable to manufacture. To address the shortcomings in reliability in manufacturing, OptiPro proposes to adapt current machinery built at OptiPro into Elastic Emission Machining equipment. Elastic Emission Machining (EEM) has been used for decades in Japan for the precise manufacturing of X-ray mirrors. This process submerges the mirror and tooling in a slurry solution made up of ultra-fine particles. These particles are then accelerated to the surface of the substrate, causing a strong bond to take place. This bond, specifically, is stronger than the covalent bonds of the substrate atoms. The fluid flow then creates a sheer force, causing the particle, and its attached substrate atom, to be removed from the surface. This atomic level of material removal is ideal for the final figuring of X-ray mirrors and can create both geometrically and crystallographically perfect surfaces. In Phase II, we propose to utilize our Phase I testbed based on the OptiPro OptiSonic 1230, to serve as the motion control system for the EEM process. Novel tooling, a new spindle design, a slurry containment tank, and advanced fluid jet polishing system will all be designed and implemented into the platform to complete its conversion into a machine capable of EEM. This testbed is capable of polishing optics up to 500 mm in length, and we mean to leverage that working envelope to polish optics ranging from 200mm to 500mm in length with differing geometries to include planar, spherical/cylindrical, off-axis ellipsoids and diaboloidal surfaces, encompassing any geometry of Kirkpatrick-Baez and Wolter Mirrors. X-ray mirrors can range from 100mm to over 1 meter in length and the machining platform is capable of handling optics up to 1200 mm in length. The proposed manufacturing system has already proven successful in Phase I and will significantly advance the state of the art in polishing techniques and is a crucial piece when considering the future of X-ray light sources and beam-line optics. While the X-ray mirror industry will benefit from EEM technology, they are not alone. Many industries are now requiring as close to geometrically and crystallographically perfect surfaces to include the semiconductor industry, astronomical telescope elements, defense equipment, and high-power laser systems. The proposed manufacturing testbed, manufacturing process, and ultimately finished X-ray mirrors will be designed, constructed, and tested at OptiPro facilities in Ontario, NY, just outside of Rochester. The project is expected to last 24 months.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

63 SBIR/STTR records share this UEI (2004–2025). Reported award amounts total $30,061,401. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, Department of Energy, Department of Homeland Security

Agency intelligence

Department of Energy

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