Monolithic Blocking Microstructure for 1030-1070 nm

Sensors and focal plane arrays at all wavelengths are at risk of damage from high-power laser threats. Physical Sciences Inc. (PSI) proposes to develop a monolithic nanostructure array for improved laser induced damage threshold (LIDT) over traditional multilayer optical thin films. The unique etching geometry of PSI’s nanostructure will create a high-reflection (HR) band near 1 micron wavelength that will be compatible with high-numerical aperture optical systems. The substrate and coating will be transparent and non-scattering throughout the midwave and longwave infrared. The monolithic nature of the technology will result in improved LIDT over thin film technologies due to the lack of interfacial and bulk defects in the deposited films. A modified version of PSI’s primary concept will be used to translate the technology to protect visible wavelength focal plane arrays as well as infrared focal planes.