SBIR/STTR Research Award

Super Kick: Efficient Combination Of HiPIMS & RF Discharges For Large Volume Plasma Potential And Electron Temperature Control

Award identifier 3514dbc2f93eb0bba2ae9929c8b50bd2708508966107d6f8db0709e4b7dee32dAwarding agency Department of Energy

Award amount

$205,000

Program and phase

STTR · Phase I

Award year

2020

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Award details

Awarding agency
Department of Energy
Branch
Not reported
Recipient company
STARFIRE INDUSTRIES, LLC
Proposal award date
2020-06-29
Contract end date
2021-03-28
UEI
GZ2MY2S55JW9
Solicitation number
DE-FOA-0002146
Topic code
29a

Research abstract

This SBIR project addresses the need for advanced methods to control plasma potential, plasma gradient and local chemistry during deposition process. Current thin-film deposition techniques heavily rely upon control of the energy of the ions that arrive to the substrate, specific power density arriving to the substrate, and composition of the particle flux. By controlling all three parameters it becomes possible to obtain a thin film with pre-engineered parameters. Unfortunately for different types of discharges these parameters are tightly locked by the discharge physics. To overcome limitations on control of one or another parameter, engineers use multiple additional plasma systems. The physics limitations can be by-passed if two types of discharges are combined. This can be achieved when during deposition process a sputtering the magnetron, also drives a dense plasma that fills the whole chamber. During this SBIR/STTR, we aim to enlarge understanding of using ultra-fast high-power impulse magnetron sputtering + RF plasma physics and deliver immediate benefits for industry. This will be achieved through a close University withe precompetitive fundamental research effort will result in publications and broad dissemination via conferences, journals and centers. The major benefit of the Super KickTM is the ability to perform deposition and etch in the same vacuum processing system without need of extra equipment, separate ion guns or staging between chambers. In terms of significance, the technique can improve adhesion, surface cleaning, residual stress material etching and perform oxidation/nitridation/carbonation steps with deposition for reactive applications. A technology that can both simplify and speed up the production of this cable would be an invaluable tool for microelectronics industries, energy production and storage, and advanced coatings for optical materials. The SBIR program will also support emerging small businesses and job creation in the Midwest.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

61 SBIR/STTR records share this UEI (2003–2025). Reported award amounts total $32,483,674. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: Department of Energy, Department of Defense, National Science Foundation, National Aeronautics and Space Administration, Department of Homeland Security

Agency intelligence

Department of Energy

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