Multi-Component, Co-Deposition of Patterned Films and Nanoparticles via Atmospheric Pressure Plasma CVD

Coatings provide many critical functions that add billions of dollars of value to DoD warfighter systems. Atmospheric pressure, plasma-enhanced chemical vapor deposition (AP-PECVD) developed by Surfx Technologies shows great promise in advancing the state-of-the-art in multifunctional coatings. Several chemical precursors can be introduced at the same time and converted into a thin film by the plasma, while simultaneously incorporating nanoparticles into the structure. The temperature is kept low so that thermally sensitive materials, such as acrylic can be coated. The composition and structure of the film may be tailored to achieve a wide variety of functions, for example, from scratch resistance to anti-fogging. During the Phase II program, the AP-PECVD tool will be further developed and optimized to deposit coatings over structures of varying shapes and sizes up to 24 by 24 inches squared. The tool will be capable of producing coatings that uniformly blanket the surface, or are laid down in dots or lines <5mm across to create a variety of different patterned structures. Through collaboration with Stanford University, many high quality coatings will be demonstrated with innovative physical and chemical properties of interest to the Army.