Multi-Component, Co-Deposition of Patterned Films and Nanoparticles via Atmospheric Pressure Plasma CVD

There is a growing interest in exploring the use of atmospheric pressure plasma coating for surface functionalization and deposition of nanothin coatings. Plasma atmosphere creates a unique environment through the formation of free electrons, radicals, charged and excited species that leads to unique reactions and coatings. The atmospheric pressure, non-equilibrium plasma enhanced coating processes are generally performed at, or near, room temperature. Therefore, they are ideal for temperature sensitive substrates (such as plastics) or precursors (such as bioactive materials).Army is looking for a capability to co-deposit multiple precursors, at least one of them containing nanoparticles, using independently controlled non-equilibrium atmospheric plasma conditions. This new capability for Army material research will lead to the development of multifunctional, responsive and adaptive thin film coating systems to enhance soldier and vehicle protection.LaunchBay has developed an approach that allows:Multi-precursor deposition with controlled mixingIndependent control of plasma energy and gas atmosphereProcessing of nanoparticlesPatterning of surfaces