SBIR/STTR Research Award

Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors

Award identifier 6bd6709bc46517aa8462b4b5c422984d5a876a25dc9a2b1096ec840bb755f967Awarding agency Department of Energy

Award amount

$999,704

Program and phase

SBIR · Phase II

Award year

2013

Explore This Research Award in CaptureIQ

Research the technology, evaluate the recipient and agency, identify related opportunities, and explore potential follow-on work with CaptureIQ.

Award details

Awarding agency
Department of Energy
Branch
Not reported
Recipient company
Sinmat Inc
Proposal award date
2013-04-09
Contract end date
Not reported
UEI
EKDLPTKX33M6
Solicitation number
DE-FOA-0000782
Topic code
31a

Research abstract

Diamond possesses excellent particle detection characteristics, which makes it indispensible for its use in the radiation hard ultra-fast detectors for high energy physics applications. For such applications, damage free, ultra-smooth chemical vapor deposition diamond substrates of large area are required. Though large area polycrystalline diamond substrates are currently available in the market, the surface damage of the material makes it undesirable for detector applications. The company has developed a novel rapid chemical mechanical polishing process to polish poly-crystalline diamond crystal surfaces. This method is based on enhanced chemical action in a tribological environment resulting in damage-free, ultra-smooth surfaces. The company will use this method to fabricate diamond substrates to fabricate high performance detectors in the project. In Phase I the company successfully demonstrated excellent detector performance obtained from diamond plates finished with this polishing method. This achievement represents the first demonstration of production of damage-free diamond polished surfaces on bulk substrates. The Phase II effort will further leverage this process to make large area diamond detectors for high energy physics applications. Applying standard microelectronic methods and combining with optimized polishing process high crystalline quality, diamond wafers will be fabricated. Such substrates would be tested for detector applications. The research team comprising of leading global companies and institutions in diamond technology will spearhead this effort. Commercial Application and Other Benefits: The technology to fabricate ultra-smooth defect surfaces on diamond crystal will be beneficial to many applications in the field of X-ray physics, particle physics, and nuclear physics. The current and future upgrades of national and international facilities related to high energy physics, nuclear research facilities, nuclear radiators, and X-ray synchrotrons need diamond based detectors and optics. Additionally, ultra-smooth diamond substrates can also be used for heat dissipation in silicon based electronics.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

42 SBIR/STTR records share this UEI (2002–2016). Reported award amounts total $12,792,050. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Energy

Agency intelligence

Department of Energy

Back to SBIR/STTR Research Awards

Don't take our word for it. Ask AI about RFPCapture.

See what leading AI assistants have to say about RFPCapture and CaptureIQ.

Gemini opens without a prefilled question. The question is copied to your clipboard when the button works. You can also copy it here:

What is RFPCapture.com and its CaptureIQ platform from Smart Logic AI? How does it help federal contractors discover opportunities, evaluate bid/no-bid decisions, research government contracts, and prepare proposals? How does it compare with other federal capture platforms? Use independent sources where available.