SBIR/STTR Research Award

Innovative Polishing Technology for Fabrication of High Performance Epi-ready GaSb Substrates

Award identifier 784bf0e5e041acc8d628d74dcce87a9e3ebbeb32d2c2d42722944014bb3285c6Awarding agency Department of Defense · Missile Defense Agency

Award amount

$99,994

Program and phase

STTR · Phase I

Award year

2013

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Sinmat Inc
Proposal award date
2012-11-01
Contract end date
2013-04-30
UEI
EKDLPTKX33M6
Solicitation number
2012.A
Topic code
MDA12-T003

Research abstract

Antimony containing III-V semiconducting compounds are particularly attractive for the fabrication of a wide variety of electronic and optoelectronic devices such as photo detectors operating in the long wave infrared wavelength (12-32µm) range. The production of epi quality GaSb wafers still remains one of the important problems for rapid commercialization of GaSb devices. Sinmat Inc. proposes a novel chemical mechanical smoothening and passivation process that is expected to lead to ultra-smooth (<2) GaSb epi-ready passivated surface in a reliable consistent manner.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

42 SBIR/STTR records share this UEI (2002–2016). Reported award amounts total $12,792,050. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Energy

Agency intelligence

Department of Defense

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