Flexible Nanoimprinting for IR Photodetector

It is desirable to develop a low cost and flexible nano- and micro-pattern transferring technology to form 3D photonic and electric structures. Nanotrons Corporation, in collaboration with Professor Hongwei Sun at NSF Nanomanufacturing Research Center at the University of Massachusetts Lowell (UML), proposes to fabricate lead salt based photonic crystal structures using a hybrid nanoimprinting mold in a vacuum-assisted selective nanoimprinting technique (VASNT) developed by at UML. This approach combines cutting-edge nanomaterial and manufacture and photonic device development at Nanotrons with the extensive experience in nanoimprinting development, nanomanufacturing, and simulation within the UML team. In Phase I, we will fabricate photonic crystal structures on the surface of the room temperature operated polycrystalline Infrared responsive coupler by using the proposed hybrid nanoimprinting mold and VASNT. This photonic crystal structures with resonant coupling which is turned to longer wavelengths will offer the significantly enhanced performance for longer wavelength detection. The proposed advance hybrid nanoimprinting mold and VASNT will offer highly durable nano- and micro-patterning for use in photonic device fabrication that can be economically scaled up for manufacturing.