SBIR/STTR Research Award
Flexible Micro- and Nano-Patterning Tools for Photonics
Award amount
$749,934Program and phase
STTR · Phase IIAward year
2012Award details
- Awarding agency
- Department of Defense
- Branch
- Air Force
- Recipient company
- LUMARRAY, INC.
- Proposal award date
- 2012-09-20
- Contract end date
- Not reported
- UEI
- T2HXT55KVA34
- Solicitation number
- 2010.B
- Topic code
- OSD10-T006
Research abstract
This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray"s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on non-flat surfaces, and sub-100 nm resolution. The ZP-150 is designed for compatibility with research as well as customized manufacturing of electronics, photonics and other products that employ micro- and nanoscale features. To exercise and demonstrate the enhanced performance achieved in the ZP-150, complex photonic-device structures will be written as well as computer-generated holograms and a diffractive-optical solar converter with over 30% photovoltaic efficiency. To achieve the desired enhancements, 7 specific tasks are proposed.
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Direct-Write Optical Lithography for High-Energy Diffractive Optics
- Computationally Optimized Metamaterial-Based Low-Power Integrated Photonics For Miniaturization And Ultra-Large-Scale Integration
- DIRECT WRITING OF X-RAY GRATINGS USING ZONE-PLATE-ARRAY LITHOGRAPHY (ZPAL)
- Lithography Cost Reduction for Rad Hard Integrated Circuits
- Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Precise fabrication of integrated photonic and optoelectronic systems using low-cost nanoimprint process
- Flexible Nanoimprinting for IR Photodetector
- Flexible Micro- and Nano-Patterning Tools for Photonics
- Flexible Micro- and Nano-Patterning Tools for Photonics
- Arrayed Nano-pattern Generating Tool by Plasmonic Enhanced Optical Nano-Probe
Research funding history
19 SBIR/STTR records share this UEI (2004–2022). Reported award amounts total $10,200,591. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Science Foundation, Department of Energy