Atomic Layer Deposition of Atomic Oxygen Resistant, Static Dissipative Coatings for Spacecraft

Physical Sciences Inc. (PSI) and Harvard University will continue our development of atomic oxygen (AO) and UV/VUV-resistant, static dissipative coatings for spacecraft in Low Earth Orbit (LEO).  We will build on our Phase I success and use Atomic Layer Deposition (ALD) to produce less-than or equal to 25 nm thick conformal pinhole free coatings on Kapton coupons as well as on materials commonly used for satellite construction.  We will optimize the deposition processes demonstrated during Phase I and will select the most favorable material for further development.  We will fully characterize the selected material to ensure that it meets the requirements of the satellite industry, including AO resistance, optical, electrical, and mechanical properties.  We will also build a larger reactor and will demonstrate deposition on model satellite components with complex features such as tapped holes and shadowed areas.  We will design a prototype commercial reactor and plan for its implementation during Phase III. BENEFIT: Deposition of conformal pinhole-free films that provide protection from attack by atomic oxygen and UV/VUV photons will extend the lifetime of spacecraft materials and will reduce maintenance costs, while dissipation of static charge will prevent arcing and damage to sensitive electronics in LEO applications.