SBIR/STTR Research Award

3D Integrated Full Color Microdisplays Based on InGaN/AlGaInP Semiconductor Microemitter Arrays

Award identifier 2e1254a45578633a0e267041388f9a00d7c9b81c2722c95f924f4cc65048e74eAwarding agency Department of Defense · Army

Award amount

$70,000

Program and phase

SBIR · Phase I

Award year

2007

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
III-N Technology, Inc
Proposal award date
2007-12-13
Contract end date
2008-06-13
UEI
Not reported
Solicitation number
2007.2
Topic code
A07-082

Research abstract

The goal of this SBIR project is to develop next generation inorganic semiconductor based emissive microdisplays with the following merits: •Much higher brightness and power efficiency (5 x) than the current filter based LCD and OLED microdisplays. •Resolution and pixel density higher than 15 micron per pixel with VGA, SVGA and higher format. •RGB narrow bandwidth (~ 25 nm) with high color fidelity and gamut exceeding the current display standard. •Broad full color tunability. •High gray scale. •Wide viewing angle (>120 o). •Pixel response on nanoseconds scale. •Robust and long lifetime. To achieve the above goals, the proposed architecture will be based on 3D integration of stacked semiconductor RGB micro-emitter pixels with silicon CMOS driver/processor. The RGB micro-emitters have a vertically stacked structure with full-color tunability, ensuring a minimum pixel size. They are based on highly efficient InGaN for blue/green wavelength and AlGaInP for red wavelength emission, which are vertically integrated through thin-film transfer. The micro-emitter array will be bonded onto a silicon IC driver/processor substrate by flip-chip bonding and SiO2 based wafer bonding.

Technology keywords

Not reported

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Agency intelligence

Department of Defense

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