Fabrication of Lithium-niobate Optical Wafers (FLOW)

Thin Film Lithium Niobate (TFLN) is a critical material platform that meets the Department of Defense (DoD) requirements for deployable systems. It offers low size, weight, and power (SWaP), a wide optical bandwidth, fast optical response, broad optical transparency, and seamless integration with other key material platforms. This combination of properties are unmatched by other material platforms, making TFLN ideal for DoD applications such as laser support systems for inertial navigation, RF-over-fiber communication, and Light Detection and Ranging (LIDAR) for target acquisition.ÝTo meet DoD specifications, thin TFLN wafers (< 300 nm) with very low total thickness variation (TTV < ±20 nm) are required for device implementation. However, the only current supplier of optical-grade TFLN is a foreign company that poses a supply chain risk. Additionally, existing thin TFLN wafers do not meet the minimum TTV requirements for DoD applications. To address this challenge, PSI will develop the Fabrication of Lithium-Niobate Optical Wafers (FLOW) process to produce optical-grade, thin film TFLN that meets DoD application requirements, within a secure United States based supply chain.Ý