Not Available
Award amount
$99,442Program and phase
SBIR · Phase IAward year
2000Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- TimeDomain CVD Inc
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- REJ2GMYAKAA7
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- SBIR Phase I: Atmospheric Pressure Deep Etch for MEMS Manufacturing and Integration
- SBIR Phase I: Nanoporous Nano-laminated Ultra Low-K Dielectric
- SBIR Phase I: Atmospheric Pressure Molecular Layer CVD
- Molecular Layer Chemical Vapor Deposition for Advanced Metallization
- Inductive Plasma Physical Vapor Deposition for Shape Memory Alloys
Research funding history
6 SBIR/STTR records share this UEI (1998–2009). Reported award amounts total $587,963. Reported amounts are not federal obligations.
Phases: Phase I
Agencies: National Science Foundation, Department of Defense