NANOSTRUCTURES FOR OPTICAL SOURCES AND DETECTORS

WE PROPOSE TO DEVELOP NANOSTRUCTURE INGAASP LIGHT SOURCES AND INGAAS LIGHT DETECTORS DURING A THREE-PHASE PROGRAM. PHASE I WILL DETERMINE THE FEASIBILITY OF USING CHLORINATED CHEMISTRIES TO ENHANCE THE GROWTH OF THESE NANOSTRUCTURES. SPECIFICALLY, WE WILL INVESTIGATE AND COMPARE THE GROWTH AND PROPERTIES OF INGAASP AND INGAAS NANOSTRUCTURES LATTICE-MATCHED TO INP SUBSTRATES BY THREE GROWTH TECHNIQUES. THESE ARE TO BE CONVENTIONAL LOW-PRESSURE OMCVD, CHLORINATED CHEMISTRY OMCVD, AND HCL-INJECTED HYDRIDE VPE. AN ASSESSMENT OF THE RELATIVE MERITS OF THESE THREE TECHNIQUES WILL BE MADE AND A PHASE II PROGRAM PLAN GENERATED. THE PHASE II PROGRAM WILL DEMONSTRATE NANOSTRUCTURE OPTOELECTRONIC DEVICES FABRICATED USING THE PREFERRED GROWTH TECHNIQUE. PHASE III WILL FOCUS ON THE COMMERCIALIZATION OF THE DEVICES DEVELOPED IN PHASE II AND IS ANTICIPATED TO BE DIRECTED TOWARD OEIC COMPONENTS MONOLITHICALLY FABRICATED USING TECHNOLOGY UNDER PARALLEL DEVELOPMENT.