SBIR/STTR Research Award

High Growth Rate GaN MOCVD Platform for Ultrahigh Voltage Devices

Award identifier 825cc529823ff3a46776cbb3cec41c03cacc661549feeed1e1e2341982520f11Awarding agency Department of Defense · Navy

Award amount

$124,986

Program and phase

SBIR · Phase I

Award year

2019

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Award details

Awarding agency
Department of Defense
Branch
Navy
Recipient company
AGNITRON TECHNOLOGY, INC.
Proposal award date
2018-10-15
Contract end date
2020-01-30
UEI
NGDVGM4G1YM4
Solicitation number
18.2
Topic code
N182-134

Research abstract

Future DoD and Navy missions require advances in current high voltage power electronics technology. In this proposed effort, Agnitron will investigate the limitations of existing MOCVD technology and propose solutions towards an MOCVD system for Gallium Nitride capable of growth rates over 10um per hour at pressures from low to super atmospheric. The goal is to achieve low background concentrations under these conditions as well as demonstrate heavily doped p+ and n+ (Al)GaN layers <50nm thick. At the end of this program we will establish a plan for optimizing the growth process as well as reactor configuration to meet the objectives of the Phase I program.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

16 SBIR/STTR records share this UEI (2013–2024). Reported award amounts total $11,320,870. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: Department of Defense, National Science Foundation, National Aeronautics and Space Administration, Department of Energy

Agency intelligence

Department of Defense

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