Transformational GaN Substrate Technology
Award amount
$1,500,177Program and phase
SBIR · Phase IIAward year
2014Award details
- Awarding agency
- Department of Energy
- Branch
- ARPA-E
- Recipient company
- KYMA TECHNOLOGIES, INC.
- Proposal award date
- 2014-09-10
- Contract end date
- Not reported
- UEI
- GDV6R1VLRVN7
- Solicitation number
- DE-FOA-0000941
- Topic code
- DE-FOA-0000941
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Low-Cost Manufacturing of High Quality GaN Substrates
- Pulsed Sputter Deposition (PSD) for Efficient Doping for GaN HEMT Contacts
- HVPE-Based Gallium Oxide Epiwafer Development
- High Responsivity Optical GaN Switch
- Radiation-Tolerant Vertical GaN Diodes
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Vertical GaN Substrates
- Epitaxial GaN on Flexible Metal Tapes for Low-Cost Transistor Devices
- High-quality, low-cost GaN single crystal substrates for high-power devices
- Vertical GaN Substrates
- Advanced Manufacturing and Performance Enhancements for Reduced-cost Silicon Carbide MOSFETs (AMPERES)
Research funding history
83 SBIR/STTR records share this UEI (2000–2024). Reported award amounts total $34,128,798. Reported amounts are not federal obligations.
Phases: Phase I, Phase II, Phase II – Direct to Phase II
Agencies: Department of Defense, Department of Energy, National Aeronautics and Space Administration