High Voltage Metal Insulator Metal (MIM) Capacitor Technology
Award amount
$149,960Program and phase
SBIR · Phase IAward year
2012Award details
- Awarding agency
- Department of Defense
- Branch
- Navy
- Recipient company
- SUNDEW TECHNOLOGIES LLC
- Proposal award date
- 2012-06-05
- Contract end date
- 2014-02-01
- UEI
- Q4JJMNHWLNU4
- Solicitation number
- 2012.1
- Topic code
- N121-071
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Atomic Layer Deposition Technology for Gallium Nitride Microwave Monolithic Integrated Circuits
- High Voltage Metal Insulator Metal (MIM) Capacitor Technology
- Atomic Layer Deposition Technology for Gallium Nitride Microwave Monolithic Integrated Circuits
- Atomic Layer Deposition Technology for Gallium Nitride Microwave Monolithic Integrated Circuits
- Development of Robust, Effective, Inexpensive, Flexible Water and Oxygen Barriers for Flexible Organic Light-Emitting Diodes (FOLEDs)
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
Research funding history
13 SBIR/STTR records share this UEI (2002–2017). Reported award amounts total $8,016,595. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Science Foundation