SBIR/STTR Research Award

High Voltage Metal Insulator Metal (MIM) Capacitor Technology

Award identifier bd31fcfcbf676f537d5bd239d98431648d40fe7a7f0d2f8643b0a8eede2a6e26Awarding agency Department of Defense · Navy

Award amount

$149,960

Program and phase

SBIR · Phase I

Award year

2012

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Award details

Awarding agency
Department of Defense
Branch
Navy
Recipient company
SUNDEW TECHNOLOGIES LLC
Proposal award date
2012-06-05
Contract end date
2014-02-01
UEI
Q4JJMNHWLNU4
Solicitation number
2012.1
Topic code
N121-071

Research abstract

This proposal targets the development of commercially viable Atomic Layer Deposition (ALD) process for the manufacturing of high voltage metal-insulator-metal (MIM) capacitors for gallium nitride (GaN) Monolithic Microwave Integrated Circuits (MMICs) applications. In particular, this project objective is to provide a higher dielectric constant substitution for currently used dielectric layers, integrated with metal electrodes. Higher voltage capacitors will enable the development and manufacturing of GaN MMICs with ground-breaking impact on performance, power efficiency, size and cost of many military systems and commercial products.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

13 SBIR/STTR records share this UEI (2002–2017). Reported award amounts total $8,016,595. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation

Agency intelligence

Department of Defense

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