SBIR/STTR Research Award
Non-contact lithography based on optical superlensing at 193 nm
Award amount
$98,979Program and phase
SBIR · Phase IAward year
2008Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Advanced Research Projects Agency
- Recipient company
- Tanner Research, Inc.
- Proposal award date
- 2008-04-30
- Contract end date
- 2008-09-17
- UEI
- X7KGA99EEDX5
- Solicitation number
- 2007.2
- Topic code
- SB072-028
Research abstract
We are proposing the development of a “negative-index” material at 193 nm for use as a “superlens” for high resolution lithography. Superlensing has already been demonstrated at 365 nm, and this work will simply extend the demonstrated principles to 193 nm with a new set of materials.In Phase I, we will demonstrate this superlens with 30 nm half-pitch features, while restricting ourselves to a contact mask. In Phase II, we will extend the scheme to non-contact lithography based on superlensing at 193 nm.
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Compact Sensor for Non-Destructive Propellant Mechanical Property Evaluation
- Title: 270V DC Add-on Upgrade for CMBRE
- Radiation Performance Improvements for EFIs
- Retrofittable Probe Latching Detection Concepts for Unmanned Aerial Refueling
- Novel Subminiature Assembly, MEMS Ultrasound, for implementation of SDPSS
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Superlens for 193nm Lithography
- Nanolithography with negative index materials.
- Superlens for 193nm Lithography
Research funding history
185 SBIR/STTR records share this UEI (1987–2025). Reported award amounts total $49,118,132. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Science Foundation, Department of Health and Human Services, Department of Energy, Department of Agriculture, National Aeronautics and Space Administration