Scanning Probe Microscopy

The DOE¿s interest in the fundamental research and development of advanced materials, devices, and structures necessitates associated research into advanced characterization metrology. Such characterization needs are particularly evident in regimes operating at nanometer scales. This project is concerned with one aspect of this very broad metrology field: the measurement of high frequency magnetic fields at the nanometer scale. One technique for performing calibrated field measurements on the nanometer scale is Scanning Hall Probe Microscopy (SHPM). Another technique for characterizing magnetic fields and structures on this scale is Magnetic Force Microscopy (MFM), which is based on the Atomic Force Microscope (AFM). Although MFM provides high imaging resolution, existing probes do not provide a quantified measurement of the magnetic field strength. On the other hand, SHPM provides a quantified field measurement, but does not have MFM¿s spatial resolution. Therefore, this project will develop a metrology that combines the intrinsic spatial resolution of MFM with the intrinsic quantification capability of SHPM. Such a device would greatly enhance both the spatial accuracy of the magnetic field measurement as well as the type of sample that can be characterized, thus achieving a measurement capability that does not currently exist.