SBIR/STTR Research Award

LATTICE (Large-Area high-Throughput Thermal Inspection for Complex Electronics)

Award identifier 2a5a00241f0390137bab59f4c89a5f547a8b63cbb2437f470e343d253d04354cAwarding agency Department of Defense · Air Force

Award amount

$1,749,993

Program and phase

SBIR · Phase II – Direct to Phase II

Award year

2025

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Award details

Awarding agency
Department of Defense
Branch
Air Force
Recipient company
LASER THERMAL ANALYSIS, INC
Proposal award date
2025-09-29
Contract end date
2026-12-29
UEI
E14VYCEW9YG8
Solicitation number
X25.5
Topic code
AFX255-DPCSO6

Research abstract

Laser Thermal proposes to extend the capabilities of its FASTR (Frequency And Steady-state ThermoReflectance) system to enable fully automated thermal metrology for wafer-level materials characterization, integrating FOUP/FOSB-based wafer handling and supporting near-line inspection workflows in semiconductor manufacturing environments. This extension will allow the FASTR platform to move beyond research and pilot line applications into scalable, production-adjacent use cases, addressing unmet needs in high-resolution, non-contact thermal property screening of full 300 mm wafers. FASTR is a precision thermal metrology platform that combines steady-state thermoreflectance (SSTR) and frequency-domain thermoreflectance (FDTR) in a unified architecture. This dual-mode operation allows for rapid, accurate, and spatially resolved measurement of critical thermal properties, including in-plane and cross-plane thermal conductivity, interfacial thermal resistance (TBR), and volumetric heat capacity. These metrics are essential for characterizing thin films, multilayer stacks, and subsurface thermal features in advanced microelectronic materials. While the existing FASTR platform supports automated stage-based scanning of 150 mm and 300 mm wafers, current throughput is limited by manual sample handling and alignment. To bridge the gap between lab-scale capability and fab-integrated inspection, Laser Thermal proposes a fully automated wafer handling upgrade. This will include integration of standard FOUP/FOSB interfaces, robotic wafer loading/unloading, alignment automation, and recipe-driven scanning protocols. The result will be a turnkey system capable of high-throughput, high-resolution thermal metrology suitable for near-line deployment. The automated FASTR platform will enable advanced process control and R&D screening of temperature-sensitive properties in front-end and packaging materials.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

7 SBIR/STTR records share this UEI (2023–2025). Reported award amounts total $6,383,175. Reported amounts are not federal obligations.

Phases: Phase I, Phase II – Direct to Phase II, Phase II

Agencies: Department of Defense, Department of Commerce

Agency intelligence

Department of Defense

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