SBIR/STTR Research Award

Radiation Hardened Engineered Substrates for Time and Space Resolution

Award identifier 480244eedca44adefcd0d3bef81884f402db0b8acb25533af778a53fac5fc77dAwarding agency Department of Energy

Award amount

$199,986

Program and phase

SBIR · Phase I

Award year

2019

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Award details

Awarding agency
Department of Energy
Branch
Not reported
Recipient company
CACTUS MATERIALS, INC.
Proposal award date
2019-07-01
Contract end date
2020-03-31
UEI
SX7VM5R549M7
Solicitation number
DE-FOA-0001941
Topic code
30b

Research abstract

We propose to develop engineered substrates to improve radiation hardness and stability of pixel sensors by using wafer bonding and graded epitaxial techniques. We aim to produce a moderately doped (1E13-1E16) thin buried gain layer (~4-6 micron) using graded epitaxy on a high resistivity bonded substrate. Current state-of-the-art is a proposed sensor design of low to moderate gain (x10-50) reach through silicon avalanche diodes (LGADs) to achieve ~10 ps time resolution for collider experiments. The current generation of reach-through diodes suffers from large fractional dead area at the edges of the pixel (>50 micron), poor spatial resolution, and only moderate radiation hardness. The standard LGAD is a “reach through” diode - a deep moderately doped p “gain” implant though a shallow, highly doped n-type anode. When depleted, the ionized dopant atoms generate a gain field in the reach-through region. The field depends in density and distribution of dopants. In this process, radiation removes donors and creates acceptors, which modifies the field in the reach-through region, ultimately eliminating gain. A moderately doped thin buried (~4-6 micron) layer replacing a reach-through implant can address some of these problems. The epitaxial layer can be made well defined thinner gain layer and denser than the reach-through design with the same number of dopant atoms, hence improve effect of radiation. The substrate construction would be based on Cactus Materials, Inc. developed vacuum wafer bonding techniques with oxide free interface (silicon to silicon direct bonding) and commercially available standard epitaxy layer. The dopant concentration and depth of epitaxial layers will be varied along with bonding interface characterization to optimize the performance of the substrates (i.e. charge collection). The characteristics can be tuned by adjusting depth and density of the epitaxy. “AC coupled” buried layer will solve edge problem and make design simpler. In the AC coupled LGAD the prompt signal is coupled through a thin oxide layer to the pickup electrode. The sheet resistance of the anode implant and coupling capacitance has to be tuned to provide the proper output pulse shape, neighbor signal, and DC coupling to ground.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

14 SBIR/STTR records share this UEI (2018–2023). Reported award amounts total $5,904,879. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Energy, National Aeronautics and Space Administration

Agency intelligence

Department of Energy

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