SBIR/STTR Research Award

Low-loss High-power Cryogenic RF Switches using III-Nitride MOSHFETs

Award identifier 89882ae9aa1acba5e827a3632c51e8fc006b2d7cd7ff081f954f6d9e0327749aAwarding agency Department of Defense · Navy

Award amount

$746,724

Program and phase

SBIR · Phase II

Award year

2009

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Award details

Awarding agency
Department of Defense
Branch
Navy
Recipient company
Sensor Electronic Technology, Inc.
Proposal award date
2009-09-08
Contract end date
2012-09-15
UEI
ZLAMG4KBKN15
Solicitation number
2007.2
Topic code
N07-147

Research abstract

We propose to carry out research and development of highly efficient broadband cryogenic switches using voltage controlled 2D electron gas in III-Nitride heterostructure field-effect transistors (HFETs). Due to extremely high electron density in the 2D channel formed at the AlGaN/GaN interface, III-Nitride HFET - based RF switches offer low insertion loss, lower than that of pin diodes and quite comparable to that achievable with MEMS switches. As compared to MEMS and other switch types, III-N HFET switches have much higher switching powers, shorter switching times, excellent temperature stability. Importantly, the HFET performance is expected to actually improve at cryogenic temperatures.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

80 SBIR/STTR records share this UEI (1984–2014). Reported award amounts total $19,732,151. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Health and Human Services, National Aeronautics and Space Administration, Department of Agriculture

Agency intelligence

Department of Defense

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