SBIR/STTR Research Award

AlInN-GaN High Voltage Enhancement Mode HEMT for Power Converters-Inverters

Award identifier ad1d1efc7d7225b4dd8255604f5d37c3af0f084d9ae57f596f9caa1d6571b70aAwarding agency Department of Defense · Missile Defense Agency

Award amount

$99,810

Program and phase

SBIR · Phase I

Award year

2009

Explore This Research Award in CaptureIQ

Research the technology, evaluate the recipient and agency, identify related opportunities, and explore potential follow-on work with CaptureIQ.

Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
NITEK, INC.
Proposal award date
2009-03-27
Contract end date
2009-09-27
UEI
GXLNRB6ZFNB7
Solicitation number
2008.3
Topic code
MDA08-029

Research abstract

The goal of the Phase I program is to demonstrate the feasibility of a high-voltage, high-temperature insulating gate AlInN-GaN/i-SiC enhancement-mode HEMT to serve as the basic building block of a power converter/inverter. Our technical approach is to use lattice matched AlInN-GaN epilayers in conjunction with a field-plated insulating gate HEMT device design and a fluorine treatment to accomplish the goal. We believe that the combination of lattice matched AlInN field-plated HEMTs, a unique pulsed PECVD insulator deposition and the use of a controlled fluorine treatment should overcome the issues currently faced by the AlGaN-GaN based technology. Large gate devices will be fabricated in the Phase I to establish the feasibility of our device design. Nitek currently has the baseline materials technology which is sufficient for our Phase I program needs. It will also to be improved under a separate Air-Force supported Phase I SBIR program. The suitability of our devices for military and commercial applications will be established via a joint processing and device testing program with DOD test labs (WPAFB and the Joint Services Task Team). In the Phase II program we will expand the gate peripheries, develop the packaging for thermal management and demonstrate circuits using the AlInN-GaN HEMT building block. In the Phase III program we will develop a large volume manufacturing technology for epitaxial wafers and devices for supply to DOD and commercial outfits in a strategic partnership with a large company.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

10 SBIR/STTR records share this UEI (2008–2011). Reported award amounts total $3,392,454. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation

Agency intelligence

Department of Defense

Back to SBIR/STTR Research Awards

Don't take our word for it. Ask AI about RFPCapture.

See what leading AI assistants have to say about RFPCapture and CaptureIQ.

Gemini opens without a prefilled question. The question is copied to your clipboard when the button works. You can also copy it here:

What is RFPCapture.com and its CaptureIQ platform from Smart Logic AI? How does it help federal contractors discover opportunities, evaluate bid/no-bid decisions, research government contracts, and prepare proposals? How does it compare with other federal capture platforms? Use independent sources where available.