SBIR/STTR Research Award

Low Cost Nanolithography Techniques Using Elastomer Shrinkage and/or Plasmon Confinement

Award identifier 987071e112935cb80cdad6a4f7a24d506af414441d27ae56ed92fd339e0f4fefAwarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$98,990

Program and phase

SBIR · Phase I

Award year

2004

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
Tanner Research, Inc.
Proposal award date
2004-11-08
Contract end date
2005-07-15
UEI
X7KGA99EEDX5
Solicitation number
2004.3
Topic code
SB043-045

Research abstract

Nanolithography remains the critical hurdle in developing and commercializing new nanotechnology devices. A low cost nanolithography technique must be developed if the promise of nanotechnology is to be fully realized. Tanner Research and Stanford University are proposing two new nanolithography techniques based on elastomer shrinkage and plasmon confinement. Both of these techniques will be pursued in parallel during Phase I wherein we will demonstrate the proof of concept for lithography at 35-40 nm feature sizes, mitigate the associated risk areas, and develop specific applications for the two techniques.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

185 SBIR/STTR records share this UEI (1987–2025). Reported award amounts total $49,118,132. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Health and Human Services, Department of Energy, Department of Agriculture, National Aeronautics and Space Administration

Agency intelligence

Department of Defense

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