SBIR/STTR Research Award

HVPE-grown InGaN Materials for Aggressive Cost Reduction of Solid State Lighting Technologies

Award identifier 9724fe4d87aa32e69b2efdc8874dc57cfb2efe95d7a6dff31a20b57f418e22a9Awarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$98,999

Program and phase

SBIR · Phase I

Award year

2009

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
KYMA TECHNOLOGIES, INC.
Proposal award date
2009-06-11
Contract end date
2010-02-28
UEI
GDV6R1VLRVN7
Solicitation number
2008.2
Topic code
SB082-053

Research abstract

Kyma Technologies will develop InGaN growth technologies using the hydride vapor phase epitaxy (HVPE) process, and will combine this with a proven GaN epitaxial growth technology to enable aggressive cost reduction for InGaN-based devices. This approach will enable a reduction in the required MOCVD growth steps in the fabrication of LEDs for solid state lighting, leading to a significant reduction in the costs of epitaxy of the LED device structure. In Phase I, Kyma will demonstrate high quality InGaN-based epitaxial layers via HVPE using a novel HVPE growth platform.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

83 SBIR/STTR records share this UEI (2000–2024). Reported award amounts total $34,128,798. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: Department of Defense, Department of Energy, National Aeronautics and Space Administration

Agency intelligence

Department of Defense

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