4H-SiC BiCMOS Development on 6â wafers in a High-Volume Production Foundry
Award amount
$167,497Program and phase
SBIR · Phase IAward year
2021Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Microelectronics Activity
- Recipient company
- GENESIC SEMICONDUCTOR INC.
- Proposal award date
- 2021-07-29
- Contract end date
- 2022-02-10
- UEI
- DV7NF6NE49J6
- Solicitation number
- 21.1
- Topic code
- DMEA211-001
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Drift Step Recovery Diode (DSRD) for Wideband (WB) and Ultra-Wideband (UWB) Pulse Generation
- Automotive-qualified SiC DMOSFETs with integrated Schottky Rectifiers
- Advanced Power Conversion Systems featuring SiC MOSFETs with In-Situ Restoration Capabilities
- Automotive-qualified 3300 V SiC MOSFETs for next-generation extreme fast chargers
- Stackable, high voltage Silicon Carbide based DSRDs
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Manufacturing Platform for High-Temperature CMOS ICs on SiC
- Highly-Integrated SiC BiCMOS/Power Device Technology: Design, Modeling, and Reliability Metrics
Research funding history
41 SBIR/STTR records share this UEI (2006–2021). Reported award amounts total $20,963,272. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Energy, Department of Defense, National Aeronautics and Space Administration, Department of Commerce